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Inpria offers a new approach to photoresists to enable continued scaling of semiconductor device sizes and performance. Inpria was founded in 2007 as a spin-out from Oregon State University`s Department of Chemistry and the NSF-funded Center for Sustainable Materials Chemistry. Since then we`ve recruited a diverse team with decades of experience working at organizations such as Intel, HP, IMEC, SEMATECH, Kovio, Freeslate, Lawrence Berkeley National Labs, and Los Alamos National Labs. By focusing on the emerging requirements, Inpria has developed the only purpose-built solution to support EUV lithography at the 7nm process node and beyond.
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